UV Lithography Machine

 

As technology continues to be updated and iterated, its functions are becoming increasingly perfect. UV lithography machines of various models, specifications and configurations can meet the needs of different industries, such as semiconductor manufacturers, research institutions, etc. With the development of emerging industries such as intelligent manufacturing and artificial intelligence, UV lithography machines are playing an increasingly important role in promoting technological progress and industrial upgrading.

As a high-end manufacturing equipment, UV lithography machine has the advantages of precision processing, efficient production, stability and reliability, etc. It plays an important role in enhancing industrial competitiveness and promoting technological development. In the future, with the continuous development of technology, UV lithography machines will continue to exert their huge potential and contribute to the development of the global high-tech industry.

 

 

1. The equipment takes a long time to design and manufacture, and has many product specifications (currently, the company regularly produces 25 types of finalized products), and has accumulated rich design and manufacturing experience: our company has designed, manufactured, and sold high-precision photolithography machines by itself. It's been over 20 years.

2. Through years of continuous improvement, we have made the equipment technology more perfect and the operation more stable and reliable. Some of the mechanisms or systems of the equipment are original to our company (many similar domestic equipment are not up to standard or have improper functions). The specific performance In the following areas:

(1) In terms of mechanical alignment and registration system:

The air-floating leveling technology is used to make the equipment have excellent leveling performance. It can effectively compensate for the poor contact of the plate caused by the wedge error of the plate, making the exposed lines better and reducing the serious scratches on the plate caused by excessive leveling force. , In addition: the "contact", "separation" of the equipment, the drift is extremely small, we have a number of measures to reduce the drift, they are: the plate does not move, the plate moves, the direction of the force of the X, Y, θ adjustment components and the direction of its own weight consistent; consistent;

The Z-axis lifting movement is a ball linear guide, which adopts an interference fit movement. There is no lateral gap in the up and down movement, eliminating lateral drift; the plate is adsorbed under the plate frame, and when it is vacuum-sealed, it will not behave like it is on the plate frame. Due to the "area difference" generated during vacuum sealing, the upward force is larger than the downward force, which causes large deformation of the plate and large accumulated spacing error of the graphics;

a. The plate is fixed by vacuum adsorption, which is not only convenient for loading and unloading the plate, but also ensures that there will be no lateral drift during contact and separation, which not only improves the overlay accuracy, but also greatly increases the overlay speed;

b. After the plate frame is turned over, the connection with the machine body is vacuum adsorption. When the plate is on top, the plate frame will not drift laterally.

(2) In terms of aligning the observation system:

1.6~10x stepless zoom monocular microscope, connected to a 19″ LCD display through a CCD camera, with a total magnification of 91x~570x.

(3) In terms of exposure system:

The light uniformity is good, within the range of Ф100mm, the light unevenness is ≤±3%, and the service life is long (the normal service life of the LED ultraviolet light source is not less than 20,000 hours). The plate rack makes a flip movement relative to the film-bearing table: First, It is convenient for loading and unloading the film. Secondly, it is easy to clean the film and plate with nitrogen or an ear cleaning ball. The plate frame is fixed by vacuum adsorption, which not only reduces "drift", but also makes the operation easier.

 

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